近期，由中國科學(xué)院微電子研究所、國科大微電子學(xué)院聯(lián)合創(chuàng)辦的國際全英文學(xué)術(shù)期刊《Journal of Microelectronic Manufacturing》（JoMM，國際標(biāo)準(zhǔn)期刊編號ISSN：2578-3769）成功出版了第二卷第一期。
本期專題文章如下：
Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study
Du Zhang, Yu-Hao Tsai, Hojin Kim et al. 2019 JoMM Volume 2, Issue 1: 19020103
The Variables and Invariants in the Evolution of Logic Optical Lithography Process
Qiang Wu. 2019 JoMM Volume 2, Issue 1: 19020101
JoMM 旨在發(fā)表集成電路制造領(lǐng)域中從實(shí)驗(yàn)室理論階段到工業(yè)大規(guī)模量產(chǎn)階段的研究成果，內(nèi)容包括但不限于 Design、 Process、 Metrology & Yield Control、 Packaging、 Materials、 Equipment 等方面。 作為開放閱覽電子學(xué)術(shù)期刊， JoMM 致力于實(shí)現(xiàn)快速發(fā)表，稿件錄用后即時上線，可閱覽、下載、引用。目前，JoMM正在進(jìn)行2019年征稿，并免版面費(fèi)，詳情請查看官網(wǎng)www.lithotechsolutions.org.
歡迎投稿！
“Journal of Microelectronic Manufacturing”Volume 2, Issue1 is Published & Call for 2019 Papers
Jouranl of Microelectronic Manufacturing (JoMM) is an international peer-reviewed journal (ISSN: 2578-3769) co-founded by theInstitute of Microelectronics of Chinese Academy of Sciences (IMECAS) and School of Microelectronics, University of Chinese Academy of Sciences. JoMM Volume 2, Issue 1 (2019) is published recently.
Feature articles are:
Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study
Du Zhang, Yu-Hao Tsai, Hojin Kim et al. 2019 JoMM Volume 2, Issue 1: 19020103
The Variables and Invariants in the Evolution of Logic Optical Lithography Process
Qiang Wu. 2019 JoMM Volume 2, Issue 1: 19020101
JoMM aims at reporting the progress on the cutting-edge advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. Topic includes, but is not limited to Design, Process, Metrology & Yield Control, Packaging, Materials, Equipment. JoMM strives for shortened publication cycle, articles are published online for reading, downloading and citing as soon as accepted. Now JoMM is inviting papers for 2019 issues, and the publication charge is free. For more details, please visit www.lithotechsolutions.org.
Looking forward to your submissions!
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